검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Concerted Growth and Ordering of Cobalt Nanorod Arrays as Revealed by Tandem in Situ SAXS-XAS Studies Cormary B, Li T, Liakakos N, Peres L, Fazzini PF, Blon T, Respaud M, Kropf AJ, Chaudret B, Miller JT, Mader EA, Soulantica K Journal of the American Chemical Society, 138(27), 8422, 2016 |
| 2 |
Influence of Chemical Composition on the Catalytic Activity of Small Bimetallic FeRu Nanoparticles for Fischer-Tropsch Syntheses Meffre A, Iablokov V, Xiang YZ, Barbosa R, Fazzini PF, Kelsen V, Kruse N, Chaudret B Catalysis Letters, 145(1), 373, 2015 |
| 3 |
Monitoring the Coordination of Amine Ligands on Silver Nanoparticles Using NMR and SERS Cure J, Coppel Y, Dammak T, Fazzini PF, Mlayah A, Chaudret B, Fau P Langmuir, 31(4), 1362, 2015 |
| 4 |
Tuning Deposition of Magnetic Metallic Nanoparticles from Periodic Pattern to Thin Film Entrainment by Dip Coating Method Dugay J, Tan RP, Loubat A, Lacroix LM, Carrey J, Fazzini PF, Blon T, Mayoral A, Chaudret B, Respaud M Langmuir, 30(30), 9028, 2014 |
| 5 |
Extended defects and precipitation in heavily B-doped silicon Cojocaru-Miredin O, Cristiano F, Fazzini PF, Mangelinck D, Blavette D Thin Solid Films, 534, 62, 2013 |
| 6 |
Effect of Germanium content and strain on the formation of extended defects in ion implanted Silicon/Germanium Fazzini PF, Cristiano F, Talbot E, Ben Assayag G, Paul S, Lerch W, Pakfar A, Hartmann JM Thin Solid Films, 518(9), 2338, 2010 |
| 7 |
Atomic scale study of a MOS structure with an ultra-low energy boron-implanted silicon substrate Duguay S, Ngamo M, Fazzini PF, Cristiano F, Daoud K, Pareige P Thin Solid Films, 518(9), 2398, 2010 |
| 8 |
Transfer of physically-based models from process to device simulations: Application to advanced SOI MOSFETs Bazizi EM, Pakfar A, Fazzini PF, Cristiano F, Tavernier C, Claverie A, Zographos N, Zechner C, Scheid E Thin Solid Films, 518(9), 2427, 2010 |
| 9 |
Laser activation of Ultra Shallow Junctions (USJ) doped by Plasma Immersion Ion Implantation (PIII) Vervisch V, Larmande Y, Delaporte P, Sarnet T, Sentis M, Etienne H, Torregrosa F, Cristiano F, Fazzini PF Applied Surface Science, 255(10), 5647, 2009 |
| 10 |
Optimum activation and diffusion with a combination of spike and flash annealing Paul S, Lerch W, Chan J, Mccoy S, Gelpey J, Cristiano F, Severac F, Fazzini PF, Bolze D Journal of Vacuum Science & Technology B, 26(1), 293, 2008 |