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| No. | Article |
|---|---|
| 1 |
Effect of near-substrate plasma density in the reactive magnetron sputter deposition of hydrogenated amorphous germanium Kaufman-Osborn T, Pollock KM, Hiltrop J, Braam K, Fazzio S, Doyle JR Thin Solid Films, 520(6), 1866, 2012 |