검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Influence of partial charge on the material removal rate during chemical polishing Suratwala T, Steele R, Miller PE, Wong LN, Destino JF, Feigenbaum E, Shen N, Feit M Journal of the American Ceramic Society, 102(4), 1566, 2019 |
| 2 |
Relationship between surface -roughness and interface slurry particle spatial distribution during glass polishing Suratwala T, Steele W, Feit M, Shen N, Wong L, Dylla-Spears R, Desjardin R, Elhadj S, Miller P Journal of the American Ceramic Society, 100(7), 2790, 2017 |
| 3 |
Mechanism and Simulation of Removal Rate and Surface Roughness During Optical Polishing of Glasses Suratwala T, Steele W, Feit M, Shen N, Dylla-Spears R, Wong L, Miller P, Desjardin R, Elhadj S Journal of the American Ceramic Society, 99(6), 1974, 2016 |
| 4 |
Microscopic Removal Function and the Relationship Between Slurry Particle Size Distribution and Workpiece Roughness During Pad Polishing Suratwala T, Feit M, Steele W, Wong L, Shen N, Dylla-Spears R, Desjardin R, Mason D, Geraghty P, Miller P, Baxamusa S Journal of the American Ceramic Society, 97(1), 81, 2014 |