화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Technological solution for the automatic replacement of the catalytic filaments in HWCVD
Nos O, Frigeri PA, Bertomeu J
Thin Solid Films, 575, 30, 2015
2 Degradation of thin tungsten filaments at high temperature in HWCVD
Frigeri PA, Nos O, Bertomeu J
Thin Solid Films, 575, 34, 2015
3 Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon
van der Werf CHM, Li H, Verlaan V, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3431, 2009
4 The development of resistive heating for the high temperature growth of alpha-SiC using a vertical CVD reactor
Eshun E, Taylor C, Diagne NF, Griffin J, Spencer MG, Ferguson L, Gurary A, Stall R
Materials Science Forum, 338-3, 157, 2000