화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Evidence of Heterogeneous Strain during Crystallization of Ge2Sb2Te5 Thin Film
Fillot F, Loubriat S, Gergaud P, Maitrejean S
Electrochemical and Solid State Letters, 14(7), H285, 2011
2 Growth of RuO2 thin films by liquid injection atomic layer deposition
Husekova K, Dobrocka E, Rosova A, Soltys J, Satka A, Fillot F, Frohlich K
Thin Solid Films, 518(16), 4701, 2010
3 Embedding of reduced pressure-chemical vapor deposition grown Ge nanocrystals in a high quality SiO2 matrix for non-volatile memory applications
Masarotto L, Yckache K, Fanton A, Aussenac F, Fillot F
Thin Solid Films, 518(19), 5382, 2010
4 Work Function Tuning of TixSiyNz Electrodes Using Partial Saturation of Chemisorbing Surface during Pulsing Chemical Vapor Deposition
Fillot F, Maitrejean S, Pierre F, Chenevier B
Electrochemical and Solid State Letters, 12(7), H272, 2009
5 Electrical and Chemical Properties of the HfO2/SiO2/Si Stack: Impact of HfO2 Thickness and Thermal Budget
Martinez E, Leroux C, Benedetto N, Gaumer C, Charbonnier M, Licitra C, Guedj C, Fillot F, Lhostis S
Journal of the Electrochemical Society, 156(8), G120, 2009
6 Quantification of SiGe layer composition using MCs+ and MCs2+ secondary ions in ToF-SIMS and magnetic SIMS
Marseilhan D, Barnes JP, Fillot F, Hartmann JM, Holliger P
Applied Surface Science, 255(4), 1412, 2008
7 Growth kinetics and boron doping of very high Ge content SiGe for source/drain engineering
Hartmann JM, Gonzatti F, Fillot F, Billon T
Journal of Crystal Growth, 310(1), 62, 2008
8 Impact of the H-2 bake temperature on the structural properties of tensily strained Si layers on SiGe
Hartmann JM, Bogumilowciz Y, Abbadie A, Fillot F, Billon T
Journal of Crystal Growth, 310(10), 2493, 2008