1 |
The origin of electron beam patterning in silver/amorphous chalcogenide bilayers Fitzgerald AG Journal of Materials Science, 50(6), 2626, 2015 |
2 |
Electron beam induced surface modification of amorphous Sb2S3 chalcogenide films Debnath RK, Fitzgerald AG Applied Surface Science, 243(1-4), 148, 2005 |
3 |
Electron beam induced chemical modification of amorphous chalcogenide-metal bilayers and its application Debnath RK, Nusbar N, Fitzgerald AG Applied Surface Science, 243(1-4), 228, 2005 |
4 |
A transmission electron microscope study of metal/chalcogenide amorphous thin films Romero JS, Fitzgerald AG, Rose M Applied Surface Science, 234(1-4), 369, 2004 |
5 |
X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films Jiang LD, Fitzgerald AG, Rose MJ, Cheung R, Rong B, van der Drift E Applied Surface Science, 193(1-4), 144, 2002 |
6 |
X-ray photoelectron spectroscopy studies of Ag-doped thin amorphous GexSb40-xS60 films Debnath RK, Fitzgerald AG, Christova K Applied Surface Science, 202(3-4), 261, 2002 |
7 |
Microstructural properties of amorphous carbon nitride films synthesised by dc magnetron sputtering Fitzgerald AG, Jiang LD, Rose MJ, Dines TJ Applied Surface Science, 175, 525, 2001 |
8 |
The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by dc magnetron sputtering Jiang LD, Fitzgerald AG, Rose MJ Applied Surface Science, 181(3-4), 331, 2001 |
9 |
Variation of bonding structure near the surface of carbon nitride films Jiang LD, Fitzgerald AG, Rose MJ Applied Surface Science, 158(3-4), 340, 2000 |
10 |
Electron-beam-induced patterning of thin film arsenic-based chalcogenides Mietzsch K, Fitzgerald AG Applied Surface Science, 162, 464, 2000 |