화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool
Meng L, Raju R, Flauta R, Shin H, Ruzic DN, Hayden DB
Journal of Vacuum Science & Technology A, 28(1), 112, 2010
2 Plasma characteristics of a multi-cusp plasma-sputter-type ion source for thin film formation of gallium nitride
Flauta R, Kasuya T, Ohachi T, Wada M
Journal of Crystal Growth, 237, 2116, 2002