검색결과 : 1건
No. | Article |
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1 |
Static dissolution rate of tungsten film versus chemical adjustments of a reused slurry for chemical mechanical polishing Coetsier CM, Testa F, Carretier E, Ennahali M, Laborie B, Mouton-arnaud C, Fluchere O, Moulin P Applied Surface Science, 257(14), 6163, 2011 |