화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Thin-film resistor fabrication for InP technology applications
Kopf RF, Melendes R, Jacobson DC, Tate A, Melendes MA, Reyes RR, Hamm RA, Yang Y, Frackoviak J, Weimann NG, Maynard HL, Liu CT
Journal of Vacuum Science & Technology B, 20(3), 871, 2002
2 Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography
Timko AG, Frackoviak J, Hopkins LC, Klemens FP, Trimble LE, Nalamasu O, Watson GP, Mansfield WM, Barr D, Li J
Journal of Vacuum Science & Technology B, 19(6), 2713, 2001
3 Wavelength-independent optical lithography
Pau S, Nalamasu O, Cirelli R, Frackoviak J, Timko A, Watson P, Klemens F, Timp G
Journal of Vacuum Science & Technology B, 18(1), 317, 2000
4 Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates
Watson GP, Kizilyalli IC, Nalamasu O, Cirelli RA, Miller M, Wang Y, Pati B, Radosevich J, Kohler R, Freyman R, Klemens F, Mansfield W, Vaidya H, Timko A, Trimble L, Frackoviak J
Journal of Vacuum Science & Technology B, 18(6), 2877, 2000
5 Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists
Pau S, Trimble LE, Blatchford JW, Watson GP, Frackoviak J, Cirelli R, Nalamasu O
Journal of Vacuum Science & Technology B, 17(6), 2499, 1999
6 Nanometer-Scale Dimensional Metrology for Advanced Lithography
Marchman HM, Griffith JE, Guo JZ, Frackoviak J, Celler GK
Journal of Vacuum Science & Technology B, 12(6), 3585, 1994
7 Patterning of X-Ray Masks Using the Negative-Acting Resist P(Si-CMS)
Mixon DA, Novembre AE, Tai WW, Jurgensen CW, Frackoviak J, Trimble LE, Kola RR, Celler GK
Journal of Vacuum Science & Technology B, 11(6), 2834, 1993
8 Study of Electron-Beam Patterning of Resist on Tungsten X-Ray Masks
Cummings KD, Resnick DJ, Frackoviak J, Kola RR, Trimble LE, Grant B, Silverman S, Haas L, Jennings B
Journal of Vacuum Science & Technology B, 11(6), 2872, 1993