검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Plasma ash processing solutions for advanced interconnect technology Fuller NCM, Worsley MA, Tai L, Bent S, Labelle C, Arnold J, Dalton T Thin Solid Films, 516(11), 3558, 2008 |
| 2 |
Effect of plasma interactions with low-kappa films as a function of porosity, plasma, chemistry, and temperature Worsley MA, Bent SF, Gates SM, Fuller NCM, Volksen W, Steen M, Dalton T Journal of Vacuum Science & Technology B, 23(2), 395, 2005 |
| 3 |
Electron temperatures of inductively coupled Cl-2-Ar plasmas Fuller NCM, Donnelly VM, Herman IP Journal of Vacuum Science & Technology A, 20(1), 170, 2002 |
| 4 |
Transient plasma-induced emission analysis of laser-desorbed species during Cl-2 plasma etching of Si Choe JY, Fuller NCM, Donnelly VM, Herman IP Journal of Vacuum Science & Technology A, 18(6), 2669, 2000 |