화학공학소재연구정보센터
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No. Article
1 Growth of high Ge content SiGe on (110) oriented Si wafers
Hikavyy A, Vanherle W, Vincent B, Dekoster J, Bender H, Moussa A, Witters L, Hoffman T, Loo R
Thin Solid Films, 520(8), 3179, 2012
2 Introduction of local tensile strain on Ge substrates by SiGe stressors selectively grown on wet chemically recessed regions for strained Ge-nMOSFETs
Moriyama Y, Kamimuta Y, Ikeda K, Tezuka T
Solid-State Electronics, 60(1), 89, 2011
3 Influence of source/drain formation process on resistance and effective mobility for scaled multi-channel MOSFET
Tachi K, Vulliet N, Barraud S, Kakushima K, Iwai H, Cristoloveanu S, Ernst T
Solid-State Electronics, 65-66, 16, 2011
4 Novel chemical precursors and novel CVD strategies enabling low temperature epitaxy of Si and Si:C alloys
Bauer M, Thomas SG
Thin Solid Films, 518, S200, 2010
5 Pulsed selective epitaxial growth of hexagonal GaN microprisms
Kim S, Schroeder JL, Sands TD
Journal of Crystal Growth, 310(6), 1107, 2008
6 Minimization of specific contact resistance in multiple gate NFETs by selective epitaxial growth of Si in the HDD regions
Dixit A, Anil KG, Rooyackers R, Leys F, Kaiser M, Collaert N, De Meyer K, Jurczak M, Biesemans S
Solid-State Electronics, 50(4), 587, 2006
7 Selective epitaxial growth of Ge quantum dots on patterned SiO2/Si(001) surfaces
Nguyen LH, LeThanh V, Debarre D, Yam V, Halbwax M, El Kurdi M, Bouchier D, Rosner P, Becker M, Benamara M, Strunk HP
Applied Surface Science, 224(1-4), 134, 2004
8 Cooperative arrangement of self-assembled Ge dots on pre-grown Si mesas
Jin G, Liu JL, Luo YH, Wang KL
Thin Solid Films, 380(1-2), 169, 2000
9 Multiple layers of silicon-on-insulator for nanostructure devices
Neudeck GW, Pae SW, Denton JP, Su T
Journal of Vacuum Science & Technology B, 17(3), 994, 1999
10 Ammonia Nitridation of Thermal Polyoxide to Eliminate Epitaxial Ambient Induced Dielectric Pinhole Formation
Fultz WW, Neudeck GW
Journal of Vacuum Science & Technology B, 14(6), 3465, 1996