화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering
Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M
Applied Surface Science, 173(1-2), 84, 2001
2 Study of ZrO2-Y2O3 films prepared by rf magnetron reactive sputtering
Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M
Thin Solid Films, 377-378, 32, 2000
3 Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering
Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M
Thin Solid Films, 377-378, 557, 2000