검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Performance evaluation of free-silicon organic-inorganic hybrid (SiO2-TiO2-PVP) thin films as a gate dielectric Najafi-Ashtiani H Applied Surface Science, 455, 373, 2018 |
| 2 |
Towards bi-carrier ion-transistors: DC and optically induced effects in electrically controlled electrochemical cells Grebel J, Banerjee A, Grebel H Electrochimica Acta, 95, 308, 2013 |
| 3 |
Method to determine the effective zeta potential in a microchannel with an embedded gate electrode Lenzi A, Viola F, Bonotto F, Frey J, Napoli M, Pennathur S Electrophoresis, 32(22), 3295, 2011 |
| 4 |
고분자 게이트 전극을 이용한 유기박막 트랜지스터의 제조 및 소자성능에 관한 연구 장현석, 송기국, 김성현 Polymer(Korea), 35(4), 370, 2011 |
| 5 |
MIS gas sensors based on porous silicon with Pd and WO3/Pd electrodes Solntsev VS, Gorbanyuk TI, Litovchenko VG, Evtukh AA Thin Solid Films, 517(22), 6202, 2009 |
| 6 |
Impact of the gate-electrode/dielectric interface on the low-frequency noise of thin gate oxide n-channel metal-oxide-semiconductor field-effect transistors Claeys C, Simoen E, Srinivasan P, Misra D Solid-State Electronics, 51(4), 627, 2007 |
| 7 |
CMOS integration of epitaxial Gd2O3 high-k gate dielectrics Gottlob HDB, Echtermeyer T, Mollenhauer T, Efavi JK, Schmidt M, Wahlbrink T, Lemme MC, Kurz H, Czernohorsky M, Bugiel E, Osten HJ, Fissel A Solid-State Electronics, 50(6), 979, 2006 |
| 8 |
Work function tuning of metal nitride electrodes for advanced CMOS devices Ren C, Faizhal BB, Chan DSH, Li MF, Yeo YC, Trigg AD, Balasubramanian N, Kwong DL Thin Solid Films, 504(1-2), 174, 2006 |
| 9 |
Growth mechanism of TiN film on dielectric films and the effects on the work function Choi K, Lysaght P, Alshareef H, Huffman C, Wen HC, Harris R, Luan H, Hung PY, Sparks C, Cruz M, Matthews K, Majhi P, Lee BH Thin Solid Films, 486(1-2), 141, 2005 |
| 10 |
Threshold voltage control for PMOSFETs using an undoped epitaxial Si channel and a p(+)-SixGe1-x gate Hellberg PE, Zhang SL, Radamsson HH, Kaplan W Solid-State Electronics, 44(11), 2085, 2000 |