검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements Curley GA, Gatilova L, Guilet S, Bouchoule S, Gogna GS, Sirse N, Karkari S, Booth JP Journal of Vacuum Science & Technology A, 28(2), 360, 2010 |
| 2 |
Investigation of InP etching mechanisms in a Cl-2/H-2 inductively coupled plasma by optical emission spectroscopy Gatilova L, Bouchoule S, Guilet S, Chabert P Journal of Vacuum Science & Technology A, 27(2), 262, 2009 |
| 3 |
Sidewall passivation assisted by a silicon coverplate during Cl-2-H-2 and HBr inductively coupled plasma etching of InP for photonic devices Bouchoule S, Patriarche G, Guilet S, Gatilova L, Largeau L, Chabert P Journal of Vacuum Science & Technology B, 26(2), 666, 2008 |