화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 MBE-Enabling technology beyond Si CMOS
Chang P, Lee WC, Lin TD, Hsu CH, Kwo J, Hong M
Journal of Crystal Growth, 323(1), 511, 2011
2 Device performance of p-Ge MOSFETs at liquid nitrogen temperature
Ohyama H, Sukizaki H, Takakura K, Motoki M, Matsuo K, Nakamura H, Sawada M, Midorikawa C, Kuboyama S, De Jaeger B, Simoen E, Claeys C
Thin Solid Films, 518(9), 2513, 2010
3 Interface control of high-k gate dielectrics on Ge
Caymax M, Houssa M, Pourtois G, Bellenger F, Martens K, Delabie A, Van Elshocht S
Applied Surface Science, 254(19), 6094, 2008
4 Characterization of platinum gerrnanide/Ge(100) Schottky barrier height for Ge channel Metal Source/Drain MOSFET
Ikeda K, Maeda T, Takagi SI
Thin Solid Films, 508(1-2), 359, 2006