화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications
Alharthi B, Dou W, Grant PC, Grant JM, Morgan T, Mosleh A, Du W, Li BH, Mortazavi M, Naseem H, Yu SQ
Applied Surface Science, 481, 246, 2019
2 Thin Ge buffer layer on silicon for integration of III-V on silicon
Yang JJ, Jurczak P, Cui F, Li KS, Tang MC, Billiald L, Beanland R, Sanchez AM, Liu HY
Journal of Crystal Growth, 514, 109, 2019