화학공학소재연구정보센터
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No. Article
1 Surface morphology of amorphous germanium thin films following thermal outgassing of SiO2/Si substrates
Valladares LD, Dominguez AB, Llandro J, Holmes S, Quispe OA, Langford R, Aguiar JA, Barnes CHW
Applied Surface Science, 316, 15, 2014
2 Low-temperature preparation of polycrystalline germanium thin films by Al-induced crystallization
Peng SL, Hu DK, He DY
Applied Surface Science, 258(16), 6003, 2012
3 Solid phase epitaxy of amorphous Ge films deposited by PECVD
Ma QB, Lieten R, Leys M, Degroote S, Germain M, Borghs G
Journal of Crystal Growth, 331(1), 40, 2011
4 Equilibrium critical thickness for strained-layer growth
Khor KE, Sarma SD
Journal of Vacuum Science & Technology B, 16(4), 2417, 1998
5 Cluster-size distribution of SiGe alloys grown by MBE
Pinto N, Murri R, Rinaldi R
Thin Solid Films, 336(1-2), 53, 1998
6 Surface processes and phase diagrams in MBE growth of Si/Ge heterostructure
Pchelyakov OP, Markov VA, Nikiforov AI, Sokolov LV
Thin Solid Films, 306(2), 299, 1997
7 A kinetic model for photochemical vapor deposition from germane and silane
Tao M
Thin Solid Films, 307(1-2), 71, 1997
8 Microstructure of Germanium Films Crystallized by High-Energy Ion Irradiation
Nakao S, Saitoh K, Ikeyama M, Niwa H, Tanemura S, Miyagawa Y, Miyagawa S
Thin Solid Films, 281-282, 10, 1996
9 Substrate Amorphization Induced by the Sputter-Deposition Process - Geometrical Aspects
Valeri S, Altieri S, Didomenico T, Verucchi R
Journal of Vacuum Science & Technology A, 13(2), 394, 1995
10 Evolution of Crystallinity During the Electrodeposition of Body-Centered-Cubic Thallium(III) Oxide Onto Glassy-Carbon
Phillips RJ, Golden TD, Shumsky MG, Switzer JA
Journal of the Electrochemical Society, 141(9), 2391, 1994