1 |
Effect of Metal Vapours on the Radiation Properties of Thermal Plasmas Gleizes A, Cressault Y Plasma Chemistry and Plasma Processing, 37(3), 581, 2017 |
2 |
Perspectives on Thermal Plasma Modelling Gleizes A Plasma Chemistry and Plasma Processing, 35(3), 455, 2015 |
3 |
Fabrication of very fine copper lines on silicon substrates patterned with poly(methylmethacrylate) via selective chemical vapor deposition Davazoglou D, Raptis I, Gleizes A, Vasilopoulou M Journal of Vacuum Science & Technology B, 22(2), 859, 2004 |
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Magnetically isolated (CuGdIII)-Gd-II pairs in the series [Cu(acacen)Gd(pta)(3)], [Cu(acacen)Gd(hfa)(3)], [Cu(salen)Gd(pta)(3)], and [Cu(salen)Gd(hfa)(3)], [acacen = N,N'-ethylenebis(acetylacetoniminate(-)), salen = N,N'-ethylenebis(salicylideniminate(-)), hfa=1,1,1,5,5,5-hexafluoropentane-2,4-dionate(-), pta=1,1,1-trifluoro-5,5-dimethylhexane-2,4-dionate(-)] Ryazanov M, Nikiforov V, Lloret F, Julve M, Kuzmina N, Gleizes A Inorganic Chemistry, 41(7), 1816, 2002 |
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Influence of gadolinium on carbon arc plasma and formation of fullerenes and nanotubes Lange H, Huczko A, Sioda M, Pacheco M, Razafinimanana M, Gleizes A Plasma Chemistry and Plasma Processing, 22(4), 523, 2002 |
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Selective chemical vapor deposition of copper on AZ 5214 (TM)-patterned silicon substrates Davazoglou D, Vidal S, Gleizes A Journal of Vacuum Science & Technology B, 19(3), 759, 2001 |
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Photo-assisted MOCVD of copper using Cu(hfa)(COD) as precursor Vidal S, Maury F, Gleizes A, Mijoule C Applied Surface Science, 168(1-4), 57, 2000 |
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A mathematical model of the carbon arc reactor for fullerene synthesis Bilodeau JF, Pousse J, Gleizes A Plasma Chemistry and Plasma Processing, 18(2), 285, 1998 |
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Modeling of a DC Plasma Torch in Laminar and Turbulent-Flow Bauchire JM, Gonzalez JJ, Gleizes A Plasma Chemistry and Plasma Processing, 17(4), 409, 1997 |
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Crystal-Structures and Magnetic-Properties of Novel (Ln(III)Cu(II)(4)) (Ln=gd, Dy, Ho) Pentanuclear Complexes - Topology and Ferromagnetic Interaction in the Ln(III) Cu-II Pair Sanz JL, Ruiz R, Gleizes A, Lloret F, Faus J, Julve M, Borrasalmenar JJ, Journaux Y Inorganic Chemistry, 35(25), 7384, 1996 |