검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Carbon nanotube Schottky type photodetectors for UV applications Filatzikioti A, Glezos N, Kantarelou V, Kyriakis A, Pilatos G, Romanos G, Speliotis T, Stathopoulou DJ Solid-State Electronics, 151, 27, 2019 |
| 2 |
Molecular Storage Elements for Proton Memory Devices Kapetanakis E, Douvas AM, Velessiotis D, Makarona E, Argitis P, Glezos N, Normand P Advanced Materials, 20(23), 4568, 2008 |
| 3 |
Soluble phthalocyanines: Perspective materials for electronics Nespurek S, Chaidogiannos G, Glezos N, Wang G, Bohm S, Rakusan J, Karaskova M Molecular Crystals and Liquid Crystals, 468, 355, 2007 |
| 4 |
Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists Patsis GP, Glezos N, Gogolides E Journal of Vacuum Science & Technology B, 21(1), 254, 2003 |
| 5 |
Probabilistic gel formation theory in negative tone chemically amplified resists used in optical and electron beam lithography Patsis GP, Glezos N Journal of Vacuum Science & Technology B, 20(4), 1303, 2002 |
| 6 |
Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation Patsis GP, Tserepi A, Raptis I, Glezos N, Gogolides E, Valamontes ES Journal of Vacuum Science & Technology B, 18(6), 3292, 2000 |
| 7 |
Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography Glezos N, Argitis P, Velessiotis D, Raptis I, Hatzakis M, Hudek P, Kostic I Journal of Vacuum Science & Technology B, 18(6), 3431, 2000 |
| 8 |
Simulation of roughness in chemically amplified resists using percolation theory Patsis GP, Glezos N, Raptis I, Valamontes ES Journal of Vacuum Science & Technology B, 17(6), 3367, 1999 |
| 9 |
Theoretical discussion of diffusion effects in negative chemically amplified resists based on contrast curve simulation Patsis GP, Meneghini G, Glezos N, Argitis P Journal of Vacuum Science & Technology B, 15(6), 2561, 1997 |
| 10 |
Application of a Reaction-Diffusion Model for Negative Chemically Amplified Resists to Determine Electron-Beam Proximity Correction Parameters Glezos N, Patsis GP, Raptis I, Argitis P, Gentili M, Grella L Journal of Vacuum Science & Technology B, 14(6), 4252, 1996 |