화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Boron ultrashallow junction formation in silicon by low-energy implantation and rapid thermal annealing in inert and oxidizing ambient
Lerch W, Gluck M, Stolwijk NA, Walk H, Schafer M, Marcus SD, Downey DF, Chow JW
Journal of the Electrochemical Society, 146(7), 2670, 1999
2 SiGeC : Band gaps, band offsets, optical properties, and potential applications
Brunner K, Schmidt OG, Winter W, Eberl K, Gluck M, Konig U
Journal of Vacuum Science & Technology B, 16(3), 1701, 1998
3 Si/SiGe field-effect transistors
Konig U, Gluck M, Hock G
Journal of Vacuum Science & Technology B, 16(5), 2609, 1998
4 Carrier mobilities in modulation doped Si1-xGex heterostructures with respect to FET applications
Hock G, Gluck M, Hackbarth T, Herzog HJ, Kohn E
Thin Solid Films, 336(1-2), 141, 1998
5 CoSi2 and TiSi2 for Si/SiGe Heterodevices
Gluck M, Schuppen A, Rosler M, Heinrich W, Hersener J, Konig U, Yam O, Cytermann C, Eizenberg M
Thin Solid Films, 270(1-2), 549, 1995