화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparative study of trimethyl silane and tetramethylcyclotetrasiloxane-based low-k films
Widodo J, Goh LN, Lu W, Mhaisalkar SG, Zeng KY, Hsia LC
Journal of the Electrochemical Society, 152(4), G246, 2005
2 Effects of O-2 and He on the properties of the trimethyl silane based low-k films
Widodo J, Goh LN, Lu W, Mhaisalkar SG, Ong S, Sudijono JL, Hsia LC, Tan PY, Zeng KY
Journal of Vacuum Science & Technology B, 22(3), 1030, 2004