검색결과 : 31건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning George SA, Naulleau PP, Mochi I, Salmassi F, Gullikson EM, Goldberg KA, Anderson EH Journal of Vacuum Science & Technology B, 28(6), C6E23, 2010 |
| 2 |
Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research Goldberg KA, Mochi I Journal of Vacuum Science & Technology B, 28(6), C6E1, 2010 |
| 3 |
Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks Mochi I, Goldberg KA, Huh S Journal of Vacuum Science & Technology B, 28(6), C6E11, 2010 |
| 4 |
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Chiu J, Dean K, Denham P, George S, Goldberg KA, Hoef B, Jones G, Koh C, La Fontaine B, Ma A, Montgomery W, Niakoula D, Park JO, Wallow T, Wurm S Journal of Vacuum Science & Technology B, 27(1), 66, 2009 |
| 5 |
Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features Clifford CH, Wiraatmadja S, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T Journal of Vacuum Science & Technology B, 27(6), 2888, 2009 |
| 6 |
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Naulleau PP, Anderson CN, Baclea-an LM, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Jones G, Koh C, La Fontaine B, Montgomery W, Wallow T Journal of Vacuum Science & Technology B, 27(6), 2911, 2009 |
| 7 |
EUV pattern defect detection sensitivity based on aerial image linewidth measurements Goldberg KA, Mochi I, Naulleau P, Liang T, Yan PY, Huh S Journal of Vacuum Science & Technology B, 27(6), 2916, 2009 |
| 8 |
Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture Goldberg KA, Naulleau P, Mochi I, Anderson EH, Rekawa SB, Kemp CD, Gunion RF, Han HS, Huh S Journal of Vacuum Science & Technology B, 26(6), 2220, 2008 |
| 9 |
Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, Niakoula D, La Fontaine B, Wallow T Journal of Vacuum Science & Technology B, 25(6), 2132, 2007 |
| 10 |
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements Goldberg KA, Barty A, Liu YW, Kearney P, Tezuka Y, Terasawa T, Taylor JS, Han HS, Wood OR Journal of Vacuum Science & Technology B, 24(6), 2824, 2006 |