화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Oxygen precipitation behavior in 300 mm polished Czochralski silicon wafers
Ono T, Rozgonyi GA, Au C, Messina T, Goodall RK, Huff HR
Journal of the Electrochemical Society, 146(10), 3807, 1999
2 Measurement of Silicon Particles by Laser-Surface Scanning and Angle-Resolved Light-Scattering
Huff HR, Goodall RK, Williams E, Woo KS, Liu BY, Warner T, Hirleman D, Gildersleeve K, Bullis WM, Scheer BW, Stover J
Journal of the Electrochemical Society, 144(1), 243, 1997