화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Hard Boron Suboxide-Based Films Deposited in a Sputter-Sourced, High-Density Plasma Deposition System
Doughty C, Gorbatkin SM, Tsui TY, Pharr GM, Medlin DL
Journal of Vacuum Science & Technology A, 15(5), 2623, 1997
2 Cu Metallization Using a Permanent-Magnet Electron-Cyclotron-Resonance Microwave Plasma/Sputtering Hybrid System
Gorbatkin SM, Poker DB, Rhoades RL, Doughty C, Berry LA, Rossnagel SM
Journal of Vacuum Science & Technology B, 14(3), 1853, 1996
3 Permanent-Magnet Electron-Cyclotron-Resonance Plasma Source with Remote Window
Berry LA, Gorbatkin SM
Journal of Vacuum Science & Technology A, 13(2), 343, 1995
4 Cu Deposition Using a Permanent-Magnet Electron-Cyclotron-Resonance Microwave Plasma Source
Berry LA, Gorbatkin SM, Rhoades RL
Thin Solid Films, 253(1-2), 382, 1994