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| No. | Article |
|---|---|
| 1 |
High-density, inductively coupled plasma etch of sub half-micron critical layers : Transistor polysilicon gate definition and contact formation Westerheim AC, Jones RD, Mager PJ, Dubash JH, Dalton TJ, Goss MW, Baum SK, Dass SK Journal of Vacuum Science & Technology B, 16(5), 2699, 1998 |