화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Accuracy of secondary ion mass spectrometry in determining ion implanted B doses as confirmed by nuclear reaction analysis
Magee CW, Jacobson D, Gossmann HJ
Journal of Vacuum Science & Technology B, 18(1), 489, 2000
2 Sputtering rate change and surface roughening during oblique and normal incidence O-2(+) bombardment of silicon, with and without oxygen flooding
Magee CW, Mount GR, Smith SP, Herner B, Gossmann HJ
Journal of Vacuum Science & Technology B, 16(6), 3099, 1998
3 Morphology of TiSi2 Films on Si Formed from Co-Deposited Ti and Si
Herner SB, Krishnamoorthy V, Naman A, Jones KS, Gossmann HJ, Tung RT
Thin Solid Films, 302(1-2), 127, 1997
4 Surface Roughness-Induced Artifacts in Secondary-Ion Mass-Spectrometry Depth Profiling and a Simple Technique to Smooth the Surface
Herner SB, Gila BP, Jones KS, Gossmann HJ, Poate JM, Luftman HS
Journal of Vacuum Science & Technology B, 14(6), 3593, 1996
5 Electron-Beam-Induced Current Determination of Shallow Junction Depth
Fitzgerald EA, Gossmann HJ, Unterwald FC, Luftman HS, Monroe D
Journal of Vacuum Science & Technology B, 12(1), 357, 1994