화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Gd silicate: A high-k dielectric compatible with high temperature annealing
Gottlob HDB, Stefani A, Schmidt M, Lemme MC, Kurz H, Mitrovic IZ, Werner M, Davey WM, Hall S, Chalker PR, Cherkaoui K, Hurley PK, Piscator J, Engstrom O, Newcomb SB
Journal of Vacuum Science & Technology B, 27(1), 249, 2009
2 Complementary metal oxide semiconductor integration of epitaxial Gd2O3
Lemme MC, Gottlob HDB, Echtermeyer TJ, Schmidt M, Kurz H, Endres R, Schwalke U, Czernohorkky M, Tetzlaff D, Osten HJ
Journal of Vacuum Science & Technology B, 27(1), 258, 2009
3 Leakage current effects on C-V plots of high-k metal-oxide-semiconductor capacitors
Lu Y, Hall S, Tan LZ, Mitrovic IZ, Davey WM, Raeissi B, Engstrom O, Cherkaoui K, Monaghan S, Hurley PK, Gottlob HDB, Lemme MC
Journal of Vacuum Science & Technology B, 27(1), 352, 2009
4 Mobility extraction in SOI MOSFETs with sub 1 nm body thickness
Schmidt M, Lemme MC, Gottlob HDB, Driussi F, Selmi L, Kurz H
Solid-State Electronics, 53(12), 1246, 2009
5 Leakage current mechanisms in epitaxial Gd2O3 high-k gate dielectrics
Gottlob HDB, Echtermeyer TJ, Schmidt M, Mollenhauer T, Wahlbrink T, Lemme MC, Kurz H
Electrochemical and Solid State Letters, 11(3), G12, 2008
6 Interface defects in HfO2, LaSiOx, and Gd2O3 high-k/metal-gate structures on silicon
Hurley PK, Cherkaoui K, O'Connor E, Lemme MC, Gottlob HDB, Schmidt M, Hall S, Lu Y, Buiu O, Raeissi B, Piscator J, Engstrom O, Newcomb SB
Journal of the Electrochemical Society, 155(2), G13, 2008
7 High-k-oxide/silicon interfaces characterized by capacitance frequency spectroscopy
Raeissi B, Piscator J, Engstrom O, Hall S, Buiu O, Lemme MC, Gottlob HDB, Hurley PK, Cherkaoui K, Osten HJ
Solid-State Electronics, 52(9), 1274, 2008
8 Investigation of MOS capacitors and SOI-MOSFETs with epitaxial gadolinium oxide (Gd2O3) and titanium nitride (TiN) electrodes
Echtermeyer T, Gottlob HDB, Wahlbrink T, Mollenhauer T, Schmidt M, Efavi JK, Lemme MC, Kurz H
Solid-State Electronics, 51(4), 617, 2007
9 Navigation aids in the search for future high-k dielectrics: Physical and electrical trends
Engstrom O, Raeissi B, Hall S, Buiu O, Lemme MC, Gottlob HDB, Hurley PK, Cherkaoui K
Solid-State Electronics, 51(4), 622, 2007
10 Scalable gate first process for silicon on insulator metal oxide semiconductor field effect transistors with epitaxial high-k dielectrics
Gottlob HDB, Mollenhauer T, Wahlbrink T, Schmidt M, Echtermeyer T, Efavi JK, Lemme MC, Kurz H
Journal of Vacuum Science & Technology B, 24(2), 710, 2006