화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Monte Carlo sensitivity analysis of CF2 and CF radical densities in a c-C4F8 plasma
Bose D, Rauf S, Hash DB, Govindan TR, Meyyappan M
Journal of Vacuum Science & Technology A, 22(6), 2290, 2004
2 Neural network modeling of growth processes
Venkateswaran S, Rai MM, Govindan TR, Meyyappan M
Journal of the Electrochemical Society, 149(2), G137, 2002
3 Characterization of showerhead performance at low pressure
Hash DB, Mihopoulos T, Govindan TR, Meyyappan M
Journal of Vacuum Science & Technology B, 18(6), 2808, 2000
4 Feature profile evolution simulation using a level set method
Hwang HH, Govindan TR, Meyyappan M
Journal of the Electrochemical Society, 146(5), 1889, 1999
5 A continuum model for the inductively coupled plasma reactor in semiconductor processing
Bose D, Govindan TR, Meyyappan M
Journal of the Electrochemical Society, 146(7), 2705, 1999