화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Roles and Effects of TiN and Pt Electrodes in Resistive-Switching HfO2 Systems
Goux L, Wang XP, Chen YY, Pantisano L, Jossart N, Govoreanu B, Kittl JA, Jurczak M, Altimime L, Wouters DJ
Electrochemical and Solid State Letters, 14(6), H244, 2011
2 A consistent model for oxide trap profiling with the Trap Spectroscopy by Charge Injection and Sensing (TSCIS) technique
Cho M, Degraeve R, Roussel P, Govoreanu B, Kaczer B, Zahid MB, Simoen E, Arreghini A, Jurczak M, Van Houdt J, Groeseneken G
Solid-State Electronics, 54(11), 1384, 2010
3 Performance and reliability of HfAlOx-based interpoly dielectrics for floating-gate Flash memory
Govoreanu B, Wellekens D, Haspeslagh L, Brunco DP, De Vos J, Aguado DR, Blomme P, van der Zanden K, Van Houdt J
Solid-State Electronics, 52(4), 557, 2008
4 Scaling CMOS: Finding the gate stack with the lowest leakage current
Kauerauf T, Govoreanu B, Degraeve R, Groeseneken G, Maes H
Solid-State Electronics, 49(5), 695, 2005
5 Scaling down the interpoly dielectric for next generation - Flash memory: Challenges and opportunities
Govoreanu B, Brunco DP, Van Houdt J
Solid-State Electronics, 49(11), 1841, 2005
6 An effective model for analysing tunneling gate leakage currents through ultrathin oxides and high-k gate stacks from Si inversion layers
Govoreanu B, Blomme P, Henson K, Van Houdt J, De Meyer K
Solid-State Electronics, 48(4), 617, 2004
7 A model for tunneling current in multi-layer tunnel dielectrics
Govoreanu B, Blomme P, Rosmeulen M, Van Houdt J, De Meyer K
Solid-State Electronics, 47(6), 1045, 2003