| 1 |
Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD
Li D, Bulou S, Gautier N, Elisabeth S, Goullet A, Richard-Plouet M, Choquet P, Granier A
Applied Surface Science, 466, 63, 2019 |
| 2 |
TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD
Li D, Gautier N, Dey B, Bulou S, Richard-Plouet M, Ravisy W, Goullet A, Choquet P, Granier A
Applied Surface Science, 491, 116, 2019 |
| 3 |
Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition
Li D, Goullet A, Carette M, Granier A, Landesman JP
Materials Chemistry and Physics, 182, 409, 2016 |
| 4 |
In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
Li D, Carette M, Granier A, Landesman JP, Goullet A
Applied Surface Science, 283, 234, 2013 |
| 5 |
X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma
Salah F, Harzallah B, van der Lee A, Angleraud B, Begou T, Granier A
Thin Solid Films, 537, 102, 2013 |
| 6 |
Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
Li D, Carette M, Granier A, Landesman JP, Goullet A
Thin Solid Films, 522, 366, 2012 |
| 7 |
XPS study of the surface composition modification of nc-TiC/C nanocomposite films under in situ argon ion bombardment
El Mel AA, Angleraud B, Gautron E, Granier A, Tessier PY
Thin Solid Films, 519(12), 3982, 2011 |
| 8 |
Preparation and modification of carbon nanotubes electrodes by cold plasmas processes toward the preparation of amperometric biosensors
Luais E, Thobie-Gautier C, Tailleur A, Djouadi MA, Granier A, Tessier PY, Debarnot D, Poncin-Epaillard F, Boujtita M
Electrochimica Acta, 55(27), 7916, 2010 |
| 9 |
Limits of the PECVD process for single wall carbon nanotubes growth
Gohier A, Minea TM, Djouadi AM, Granier A, Dubosc M
Chemical Physics Letters, 421(1-3), 242, 2006 |
| 10 |
Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas
Bousquet A, Granier A, Goullet A, Landesman JP
Thin Solid Films, 514(1-2), 45, 2006 |
