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| No. | Article |
|---|---|
| 1 |
Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications Alharthi B, Dou W, Grant PC, Grant JM, Morgan T, Mosleh A, Du W, Li BH, Mortazavi M, Naseem H, Yu SQ Applied Surface Science, 481, 246, 2019 |