검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers Grigorescu AE, van der Krogt MC, Hagen CW, Kruit P Journal of Vacuum Science & Technology B, 25(6), 1998, 2007 |