화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Heteroleptic Tin(IV) Aminoalkoxides and Aminofluoroalkoxides as MOCVD Precursors for Undoped and F-Doped SnO2 Thin Films
Verchere A, Mishra S, Jeanneau E, Guillon H, Decams JM, Daniele S
Inorganic Chemistry, 59(10), 7167, 2020
2 Low-temperature processing of ferroelectric thin films compatible with silicon integrated circuit technology
Calzada ML, Bretos I, Jimenez R, Guillon H, Pardo L
Advanced Materials, 16(18), 1620, 2004