화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Electrical characterization of amorphous silicon carbide thin films deposited via polymeric source chemical vapor deposition
Fanaei T, Camjre N, Aktik C, Gujrathi S, Lessard A, Awad Y, Oulachgar E, Scarlete M
Thin Solid Films, 516(12), 3755, 2008
2 Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
Stafford L, Lim WT, Pearton SJ, Chicoine M, Gujrathi S, Schiettekatte F, Kravchenko II
Journal of Vacuum Science & Technology A, 25(4), 659, 2007
3 Chemical and structural characterization of SiONC dielectric thin film deposited by PSCVD
Oulachgar EH, Aktik C, Dostie S, Sowerby R, Gujrathi S, Scarlete M
Journal of the Electrochemical Society, 153(11), F255, 2006
4 Characterization GaAs1-xNx epitaxial layers by ion beam analysis
Wei P, Chicoine M, Gujrathi S, Schiettekatte F, Beaudry JN, Masut RA, Desjardins P
Journal of Vacuum Science & Technology A, 22(3), 908, 2004