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| No. | Article |
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| 1 |
MBE-grown high kappa gate dielectrics of HfO2 and (Hf-Al)O-2 for Si and III-V semiconductors nano-electronics Lee WC, Lee YJ, Wu YD, Chang P, Huang YL, Hsu YL, Mannaerts JP, Lo RL, Chen FR, Maikap S, Lee LS, Hsieh WY, Tsai MJ, Lin SY, Gustffson T, Hong M, Kwo J Journal of Crystal Growth, 278(1-4), 619, 2005 |