검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Numerical Study of HBr/He Discharges in Capacitive Coupled Plasma Reactor Gul B, Aman-ur-Rehman Plasma Chemistry and Plasma Processing, 36(3), 857, 2016 |
| 2 |
Fluid Simulation of Capacitively Coupled HBr/Ar Plasma for Etching Applications Gul B, Rehman AU Plasma Chemistry and Plasma Processing, 36(5), 1363, 2016 |
| 3 |
A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes Efremov A, Kim JH, Kwon KH Plasma Chemistry and Plasma Processing, 35(6), 1129, 2015 |
| 4 |
Improvement in gate LWR with plasma curing of ArF photoresists Ando A, Matsui E, Matsuzawa NN, Yamaguchi Y, Kugimiya K, Yoshida M, Salam KMA, Kusakabe T, Tatsumi T Thin Solid Films, 515(12), 4928, 2007 |
| 5 |
Reactive Ion Etch-Induced Effects on 0.2-Mu-M T-Gate In0.52Al0.48As/In0.53Ga0.47As/InP High-Electron-Mobility Transistors Cheung R, Patrick W, Pfund I, Hahner G Journal of Vacuum Science & Technology B, 14(6), 3679, 1996 |