화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara OME, Liu XW, Kilpi L, Lyytinen J, Schneider D, Laitinen M, Julin J, Ali S, Sintonen S, Berdova M, Haimi E, Sajavaara T, Ronkainen H, Lipsanen H, Koskinen J, Hannula SP, Puurunen RL
Thin Solid Films, 552, 124, 2014
2 Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Putkonen M, Bosund M, Ylivaara OME, Puurunen RL, Kilpi L, Ronkainen H, Sintonen S, Ali S, Lipsanen H, Liu XW, Haimi E, Hannula SP, Sajavaara T, Buchanan I, Karwacki E, Vaha-Nissi M
Thin Solid Films, 558, 93, 2014
3 Optical and structural properties of nanocrystalline anatase (TiO2) thin films prepared by non-aqueous sol-gel dip-coating
Haimi E, Lipsonen H, Larismaa J, Kapulainen M, Krzak-Ros J, Hannula SP
Thin Solid Films, 519(18), 5882, 2011
4 Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments
Gosalvez MA, Nieminen RM, Kilpinen P, Haimi E, Lindroos V
Applied Surface Science, 178(1-4), 7, 2001