화학공학소재연구정보센터
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No. Article
1 Experimental and theoretical study of ion distributions near 300 mu m tall steps on rf-biased wafers in high density plasmas
Woodworth JR, Miller PA, Shul RJ, Abraham IC, Aragon BP, Hamilton TW, Willison CG, Kim D, Economou DJ
Journal of Vacuum Science & Technology A, 21(1), 147, 2003
2 Ion energy distributions at rf-biased wafer surfaces
Woodworth JR, Abraham IC, Riley ME, Miller PA, Hamilton TW, Aragon BP, Shul RJ, Willison CG
Journal of Vacuum Science & Technology A, 20(3), 873, 2002
3 Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge
Abraham IC, Woodworth JR, Riley ME, Miller PA, Hamilton TW, Aragon BP
Journal of Vacuum Science & Technology A, 20(5), 1759, 2002
4 Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges
Woodworth JR, Riley ME, Arnatucci VA, Hamilton TW, Aragon BP
Journal of Vacuum Science & Technology A, 19(1), 45, 2001
5 Surface dependent electron and negative ion density in inductively coupled discharges
Hebner GA, Blain MG, Hamilton TW, Nichols CA, Jarecki RL
Journal of Vacuum Science & Technology A, 17(6), 3172, 1999
6 Absolute intensities of the vacuum ultraviolet spectra in a metal-etch plasma processing discharge
Woodworth JR, Blain MG, Jarecki RL, Hamilton TW, Aragon BP
Journal of Vacuum Science & Technology A, 17(6), 3209, 1999
7 Influence of surface material on the boron chloride density in inductively coupled discharges
Hebner GA, Blain MG, Hamilton TW
Journal of Vacuum Science & Technology A, 17(6), 3218, 1999
8 Positive ion species in high-density discharges containing chlorine and boron-trichloride
Woodworth JR, Nichols CA, Hamilton TW
Journal of Vacuum Science & Technology A, 16(6), 3235, 1998
9 Ion energy distribution functions in inductively coupled radio-frequency discharges - Mixtures of Cl-2/BCl3/Ar
Nichols CA, Woodworth JR, Hamilton TW
Journal of Vacuum Science & Technology A, 16(6), 3389, 1998
10 Ion Distribution-Functions in Inductively-Coupled Radio-Frequency Discharges in Argon-Chlorine Mixtures
Woodworth JR, Riley ME, Miller PA, Nichols CA, Hamilton TW
Journal of Vacuum Science & Technology A, 15(6), 3015, 1997