1 |
Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation Li WL, Fei WD, Hanabusa T Applied Surface Science, 252(8), 2847, 2006 |
2 |
Internal stress measurement of fiber reinforced composite by neutron diffraction with in-situ low temperature stress measurement system Nishida M, Muslih MR, Ikeuchi Y, Minakawa N, Hanabusa T Materials Science Forum, 490-491, 239, 2005 |
3 |
In-situ observation of thermal stress in nano-size thin aluminum films Hanabusa T, Kusaka K, Shingubara S, Sakata O Materials Science Forum, 490-491, 577, 2005 |
4 |
Effect of substrate temperature on crystal orientation and residual stress in RF sputtered gallium nitride films Kusaka K, Hanabusa T, Tominaga K, Yamauchi N Materials Science Forum, 490-491, 613, 2005 |
5 |
Evaluation of residual stress in nano-TiO2 film on ITO glass by synchrotron X-ray diffraction Ju DY, Ueda T, Hatakeyama T, Arizono T, Kusaka K, Hanabusa T Materials Science Forum, 490-491, 637, 2005 |
6 |
Residual stress measurement in sputtered copper thin films by synchrotron radiation and ordinary X-rays Hataya M, Hanabusa T, Kusaka K, Tominaga K, Matsue T, Sakata O Materials Science Forum, 490-491, 661, 2005 |
7 |
Effect of substrate temperature on crystal orientation and residual stress in radio frequency sputtered gallium-nitride films Kusaka K, Hanabusa T, Tominaga K, Yamauchi N Journal of Vacuum Science & Technology A, 22(4), 1587, 2004 |
8 |
X-ray elastic constants of chromium nitride films deposited by arc-ion plating Hanabusa T, Miyagi K, Kusaka K Journal of Vacuum Science & Technology A, 22(4), 1785, 2004 |
9 |
Residual stress and thermal stress observation in thin copper films Hanabusa T, Kusaka K, Sakata O Thin Solid Films, 459(1-2), 245, 2004 |
10 |
Production of Si3N4/Si3N4 and Si3N4/Al2O3 composites by CVD coating of fine particles with ultrafine powder Hanabusa T, Uemiya S, Kojima T Chemical Engineering Science, 54(15-16), 3335, 1999 |