화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Microwave plasma chemical vapor deposition of diamond films with low residual stress on large area porous silicon substrates
Khan MA, Haque MS, Naseem HA, Brown WD, Malshe AP
Thin Solid Films, 332(1-2), 93, 1998
2 The Effects of Moisture on Strain Relief of Si-O Bonds in Plasma-Enhanced Chemical-Vapor-Deposited Silicon Dioxide Films
Haque MS, Naseem HA, Brown WD
Journal of the Electrochemical Society, 144(9), 3265, 1997
3 Post-deposition processing of low temperature PECVD silicon dioxide films for enhanced stress stability
Haque MS, Naseem HA, Brown WD
Thin Solid Films, 308-309, 68, 1997
4 High pressure high power microwave plasma chemical vapor deposition of large area diamond films
Naseem HA, Haque MS, Khan MA, Malshe AP, Brown WD
Thin Solid Films, 308-309, 141, 1997
5 Characterization of High-Rate Deposited PECVD Silicon Dioxide Films for Mcm Applications
Haque MS, Naseem HA, Brown WD
Journal of the Electrochemical Society, 142(11), 3864, 1995