| 1 |
High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
Rasappa S, Hulkkonen H, Schulte L, Ndoni S, Reuna J, Salminen T, Niemi T
Journal of Colloid and Interface Science, 534, 420, 2019 |
| 2 |
Dry etching of copper thin films in high density plasma of CH3COOH/Ar
Ryu JS, Lim ET, Choi JS, Chung CW
Thin Solid Films, 672, 55, 2019 |
| 3 |
Etch characteristics of copper thin films in high density plasma of CH4/O-2/Ar gas mixture
Lim ET, Ryu JS, Chung CW
Thin Solid Films, 665, 51, 2018 |
| 4 |
Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask
Park SJ, Kim D, Lee S, Ha Y, Lim M, Kim K
Thin Solid Films, 663, 21, 2018 |
| 5 |
Feasibility study of solvent recycle process in spin-on hard mask material manufacturing system
Jeong HJ, Park K, Yang DR
Korean Journal of Chemical Engineering, 32(12), 2375, 2015 |
| 6 |
Epitaxial Ferroelectric Heterostructures Fabricated by Selective Area Epitaxy of SrRuO3 Using an MgO Mask
Karthik J, Damodaran AR, Martin LW
Advanced Materials, 24(12), 1610, 2012 |
| 7 |
Effect of deposition temperature and thermal annealing on the dry etch rate of a-C: H films for the dry etch hard process of semiconductor devices
Lee SM, Won J, Yim S, Park SJ, Choi J, Kim J, Lee H, Byun D
Thin Solid Films, 520(16), 5284, 2012 |
| 8 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma
Kim EH, Lee TY, Min BC, Chung CW
Thin Solid Films, 521, 216, 2012 |
| 9 |
Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O-2/Ar plasma
Lee TY, Kim EH, Lee IH, Chung CW
Thin Solid Films, 525, 182, 2012 |
| 10 |
스핀코팅 하드마스크용 유-무기 하이브리드 소재에 관한 연구
유제정, 황석호, 김상범
Applied Chemistry for Engineering, 22(2), 230, 2011 |
