검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Nanoimprint planarization of high aspect ratio nanostructures using inorganic and organic resist materials Chang ASP, Peroz C, Liang XG, Dhuey S, Harteneck B, Cabrini S Journal of Vacuum Science & Technology B, 27(6), 2877, 2009 |
| 2 |
Automatic measurement of electron beam size by beam metrology technique using 20 nm test pattern Peroz C, Babin S, Machin M, Anderson E, Cabrini S, Dhuey S, Harteneck B Journal of Vacuum Science & Technology B, 27(6), 3220, 2009 |
| 3 |
Pattern noise in electron beam resists: PMMA, KRS-XE, TOK, HSQ Miller MA, Poppe WJ, Neureuther AR, Liddle A, Harteneck B Journal of Vacuum Science & Technology B, 24(6), 3025, 2006 |
| 4 |
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang GJ Journal of Vacuum Science & Technology B, 21(4), 1286, 2003 |
| 5 |
Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma Naulleau P, Goldberg KA, Anderson EH, Bokor J, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, O'Connell D, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 21(6), 2697, 2003 |
| 6 |
Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic Goldberg KA, Naulleau PP, Denham PE, Rekawa SB, Jackson KH, Liddle JA, Harteneck B, Gullikson E, Anderson EH Journal of Vacuum Science & Technology B, 21(6), 2706, 2003 |
| 7 |
Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy Chao W, Anderson EH, Denbeaux G, Harteneck B, Pearson AL, Olynick D, Salmassi F, Song C, Attwood D Journal of Vacuum Science & Technology B, 21(6), 3108, 2003 |
| 8 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 9 |
Influence of sub-100 nm scattering on high-energy electron beam lithography Anderson EH, Olynick DL, Chao WL, Harteneck B, Veklerov E Journal of Vacuum Science & Technology B, 19(6), 2504, 2001 |
| 10 |
Substrate cooling efficiency during cryogenic inductively coupled plasma polymer etching for diffractive optics on membranes Olynick DL, Anderson EH, Harteneck B, Veklerov E Journal of Vacuum Science & Technology B, 19(6), 2896, 2001 |