화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Integrated Processing of Silicon Oxynitride Films by Combined Plasma and Rapid-Thermal Processing
Hattangady SV, Niimi H, Lucovsky G
Journal of Vacuum Science & Technology A, 14(6), 3017, 1996
2 Low-Temperature Plasma-Assisted Oxidation Combined with in-Situ Rapid Thermal Oxide Deposition for Stacked-Gate Si-SiO2 Heterostructures - Integrated Processing and Device Studies
Misra V, Hattangady SV, Yasuda T, Xu XL, Hornung B, Lucovsky G, Wortman JJ
Journal of Vacuum Science & Technology A, 12(4), 1371, 1994
3 Formation of Si-SiO2 Stacked-Gate Structures by Plasma-Assisted and Rapid-Thermal Processing - Improved Device Performance Through Process Integration
Lucovsky G, Wortman JJ, Yasuda T, Xu XL, Misra V, Hattangady SV, Ma Y, Hornung B
Journal of Vacuum Science & Technology B, 12(4), 2839, 1994