화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition
Hazbun R, Hart J, Hickey R, Ghosh A, Fernando N, Zollner S, Adam TN, Kolodzey J
Journal of Crystal Growth, 444, 21, 2016
2 Tetrasilane and digermane for the ultra-high vacuum chemical vapor deposition of SiGe alloys
Hart J, Hazbun R, Eldridge D, Hickey R, Fernando N, Adam T, Zollner S, Kolodzey J
Thin Solid Films, 604, 23, 2016