검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes Mackus AJM, Heil SBS, Langereis E, Knoops HCM, van de Sanden MCM, Kessels WMM Journal of Vacuum Science & Technology A, 28(1), 77, 2010 |
| 2 |
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O-2 plasma Heil SBS, Roozeboom F, van de Sanden MCM, Kessels WMM Journal of Vacuum Science & Technology A, 26(3), 472, 2008 |
| 3 |
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor van Hemmen JL, Heil SBS, Klootwijk JH, Roozeboom F, Hodson CJ, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 154(7), G165, 2007 |
| 4 |
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor Heil SBS, van Hemmen JL, Hodson CJ, Singh N, Klootwijk JH, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 25(5), 1357, 2007 |
| 5 |
Low-temperature deposition of TiN by plasma-assisted atomic layer deposition Heil SBS, Langereis E, Roozeboom F, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 153(11), G956, 2006 |
| 6 |
Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry Heil SBS, Langereis E, Kemmeren A, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 23(4), L5, 2005 |