검색결과 : 22건
No. | Article |
---|---|
1 |
Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch Mukherjee P, Bruccoleri A, Heilmann RK, Schattenburg ML, Kaplan AF, Guo LJ Journal of Vacuum Science & Technology B, 28(6), C6P70, 2010 |
2 |
Spatial-frequency multiplication with multilevel interference lithography Chang CH, Zhao Y, Heilmann RK, Schattenburg ML Journal of Vacuum Science & Technology B, 26(6), 2135, 2008 |
3 |
Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers Ahn M, Heilmann RK, Schattenburg ML Journal of Vacuum Science & Technology B, 26(6), 2179, 2008 |
4 |
Phase control in multiexposure spatial frequency multiplication Zhao Y, Chang CH, Heilmann RK, Schattenburg ML Journal of Vacuum Science & Technology B, 25(6), 2439, 2007 |
5 |
Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers Ahn M, Heilmann RK, Schattenburg ML Journal of Vacuum Science & Technology B, 25(6), 2593, 2007 |
6 |
Doppler writing and linewidth control for scanning beam interference lithography Montoya JC, Chang CH, Heilmann RK, Schattenburg ML Journal of Vacuum Science & Technology B, 23(6), 2640, 2005 |
7 |
Monolayer/bilayer transition in Langmuir films of derivatized gold nanoparticles at the gas/water interface: An x-ray scattering study Fukuto M, Heilmann RK, Pershan PS, Badia A, Lennox RB Journal of Chemical Physics, 120(7), 3446, 2004 |
8 |
High fidelity blazed grating replication using nanoimprint lithography Chang CH, Montoya JC, Akilian M, Lapsa A, Heilmann RK, Schattenburg ML, Li M, Flanagan KA, Rasmussen AP, Seely JF, Laming JM, Kjornrattanawanich B, Goray LI Journal of Vacuum Science & Technology B, 22(6), 3260, 2004 |
9 |
Internal segregation and side chain ordering in hairy-rod polypeptide monolayers at the gas/water interface: An x-ray scattering study Fukuto M, Heilmann RK, Pershan PS, Yu SJM, Soto CM, Tirrell DA Journal of Chemical Physics, 119(12), 6253, 2003 |
10 |
Fabrication of sawtooth diffraction gratings using nanoimprint lithography Chang CH, Heilmann RK, Fleming RC, Carter J, Murphy E, Bailey TC, Ekerdt JG, Frankel RD, Voisin R Journal of Vacuum Science & Technology B, 21(6), 2755, 2003 |