| 1 |
Review of trench and via plasma etch issues for copper dual damascene in undoped and fluorine-doped silicate glass oxide
Keil DL, Helmer BA, Lassig S
Journal of Vacuum Science & Technology B, 21(5), 1969, 2003 |
| 2 |
Oxide dual damascene trench etch profile control
Keil D, Helmer BA, Mueller G, Wagganer E
Journal of the Electrochemical Society, 148(7), G383, 2001 |
| 3 |
Trapping dynamics of ethane on Si(100)-(2x1): Molecular beam experiments and molecular dynamics simulations
Reeves CT, Ferguson BA, Mullins CB, Sitz GO, Helmer BA, Graves DB
Journal of Chemical Physics, 111(16), 7567, 1999 |
| 4 |
Molecular dynamics simulations of Cl-2(+) impacts onto a chlorinated silicon surface: Energies and angles of the reflected Cl-2 and Cl fragments
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 17(5), 2759, 1999 |
| 5 |
Molecular dynamics simulations of Ar+ and Cl+ impacts onto silicon surfaces : Distributions of reflected energies and angles
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 16(6), 3502, 1998 |
| 6 |
Molecular-Dynamics Simulations of Fluorosilyl Species Impacting Fluorinated Silicon Surfaces with Energies from 0.1 to 100 eV
Helmer BA, Graves DB
Journal of Vacuum Science & Technology A, 15(4), 2252, 1997 |
