검색결과 : 1건
No. | Article |
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1 |
Plasma etching of HfO2 at elevated temperatures in chlorine-based chemistry Helot M, Chevolleau T, Vallier L, Joubert O, Blanquet E, Pisch A, Mangiagalli P, Lill T Journal of Vacuum Science & Technology A, 24(1), 30, 2006 |