화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Properties of InGaAs/GaAs metal-oxide-semiconductor heterostructure field-effect transistors modified by surface treatment
Gregusova D, Gucmann F, Kudela R, Micusik M, Stoklas R, Valik L, Gregus J, Blaho M, Kordos P
Applied Surface Science, 395, 140, 2017
2 AlGaN/GaN heterostructure field-effect transistors with multi-MgxNy/GaN buffer and Photo-CVD SiO2 gate dielectric
Lee KH, Chang PC, Chang SJ, Su YK
Solid-State Electronics, 72, 38, 2012
3 Physical and electrical characteristics of hafnium oxide films on AlGaN/GaN heterostructure grown by pulsed laser deposition
Tian F, Chor EF
Thin Solid Films, 518(24), E121, 2010
4 Determination of the average channel temperature of GaN MOSHFETs under continuous wave and periodic-pulsed RF operational conditions
Deng YQ, Islam MDM, Gaevski M, Yang ZJ, Adivarahan V, Khan A
Solid-State Electronics, 52(7), 1106, 2008
5 GaN-based FETs using Cat-CVD SiN passivation for millimeter-wave applications
Higashiwaki M, Mimura T, Matsui T
Thin Solid Films, 516(5), 548, 2008
6 High temperature performance of AlGaN/GaN HEMTs on Si substrates
Tan WS, Uren MJ, Fry PW, Houston PA, Balmer RS, Martin T
Solid-State Electronics, 50(3), 511, 2006
7 A comparison of commercial sources of epitaxial material for GaN HFETs fabrication
Wallis RH, Davies RA, Jones SK, Beanland R, Phillips WA
Journal of Crystal Growth, 230(3-4), 569, 2001
8 Material optimisation for AlGaN/GaN HFET applications
Bougrioua Z, Moerman I, Sharma N, Wallis RH, Cheyns J, Jacobs K, Thrush EJ, Considine L, Beanland R, Farvacque JL, Humphreys C
Journal of Crystal Growth, 230(3-4), 573, 2001