화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Fluorinated Acid Amplifiers for EUV Lithography
Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL
Journal of the American Chemical Society, 131(29), 9862, 2009
2 Classical trajectory study of energy transfer in pyrazine-CO collisions
Higgins C, Ju Q, Seiser N, Flynn GW, Chapman S
Journal of Physical Chemistry A, 105(12), 2858, 2001
3 Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight
Pain L, Higgins C, Scarfogliere B, Tedesco S, Dal'Zotto B, Gourgon C, Ribeiro M, Kusumoto T, Suetsugu M, Hanawa R
Journal of Vacuum Science & Technology B, 18(6), 3388, 2000
4 Musical networks: Parallel distributed perception and performance
Longuet-Higgins C
Nature, 399(6738), 746, 1999